ULVAC NLD570 DRIE Deep Reactive Ion Etcher

Location: 
ANFF-SA Node
Uni SA Mawson Lakes
Process type: 
Non Material Specific - Pattern
Process summary: 

Three electromagnetic coils and the RF antenna provide plasma intensity confined to the plane of the middle coil and diameter proportional to the electromagnet current enabling extremely high uniformity etching capability

Marquee: 
Yes
Operational Status: 
Operational
ULVAC NLD570 DRIE Deep Reactive Ion Etcher
ULVAC NLD570 DRIE Deep Reactive Ion Etcher