ULVAC NLD570 DRIE Deep Reactive Ion Etcher
Location:
ANFF-SA Node
Uni SA Mawson Lakes
Process type:
Non Material Specific - Pattern
Process summary:
Three electromagnetic coils and the RF antenna provide plasma intensity confined to the plane of the middle coil and diameter proportional to the electromagnet current enabling extremely high uniformity etching capability
Marquee:
Yes
Operational Status:
Operational

ULVAC NLD570 DRIE Deep Reactive Ion Etcher