ULVAC furnace (GaAs)

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Thermal Treatment
Process summary: 

High temperature processing. III-V materials. Single chip max dimensions 20mm x 20mm. RT to 1200C. N2, Forming gas, Ar.

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information