UDOX oxidation furnace (MOS)
Location:
ANFF-NSW Node
Lab 1
Process type:
Non Material Specific - Thermal Treatment
Process summary:
Growth of ultra high quality thin oxides (approx 5nm) Si ONLY. Prior Approval for use - High purity topsil 10kOhm cm n-type P doped, Si 28 - p-type 10-20Ohm cm. Multiple (up to 20) wafers up to 100mm diameter. 800-1000C. gases: UHP O2 (+DCE), UHP N2. high quality thin oxides (5nm)
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information
