UDOX oxidation furnace (MOS)

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Thermal Treatment
Process summary: 

Growth of ultra high quality thin oxides (approx 5nm) Si ONLY. Prior Approval for use - High purity topsil 10kOhm cm n-type P doped, Si 28 - p-type 10-20Ohm cm. Multiple (up to 20) wafers up to 100mm diameter. 800-1000C. gases: UHP O2 (+DCE), UHP N2. high quality thin oxides (5nm)

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information