Thermco - Clean Si oxidation furnace

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Thermal Treatment
Process summary: 

Growth of thick Si oxides; Fully Cleaned Silicon ONLY. Multiple (up to 20) wafers up to 100mm diameter. 800-1100C. Gases- O2, N2. wet (+H2O) or dry oxide growth. oxides up to 2 microns thick

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information