Thermco - Boron diffusion furnace

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Thermal Treatment
Process summary: 

Si p-type dopant diffusion. Fully cleaned Silicon wafers ONLY. Multiple (up to 8) wafers up to 50mm diameter. 800-1100C. Gases- N2; solid source wafer diffusion (p to p+)

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information