Tempress TS8603 3-stack 6" Quartz Tube Furnace

UNSW SPREE Tyree Energy Technology Building (TETB)
TETB Level 1, Lab 162
Process type: 
Silicon - Thermal Treatment
Process summary: 

P / B Diffusion, Anneal, Oxidation.

Operational Status: 

The Tempress tube furnace is a 3 tube semi-industrial system configured for diffusion and oxidation processes for silicon wafers.

Processes: POCl3 source P-diffusion, BBr3 source B-diffusion, wet/dry/TransLC oxidation
Wafer/substrate: 100 mm round, 125 mm x 125 mm, 156 mm x 156 mm silicon wafers
Loading: manual wafer loading/unloading of wafer carriers to furace boat on cantilever; auto load/unload of boat to furnace (soft landing).
Batch size: up to ~75-100 wafers
Process time: dependent on process details (typically ~80-90 mins for industrial solar solar cells)