Tempress TS81004 Tube Furnace, 4-stack 6" Quartz Tube

Location: 
UNSW SPREE Solar Industrial Research Foundation (SIRF)
UNSW SIRF Ground Level
Process type: 
Silicon - Thermal Treatment
Process summary: 

Furnace 4-stack 150mm Quartz Tube. Phosphorous (POCl3) diffusion, Boron (BBr3) diffusion, anneal, oxidation.

Marquee: 
Yes
Operational Status: 
Operational

The Tempress tube furnace is a 4 tube industrial system configured for diffusion and oxidation processes for silicon wafers. Processes: POCl3 source P-diffusion), BBr3 source B-diffusion, wet/dry oxidation Wafer/substrate: 100 mm round, 125 mm x 125 mm, 156 mm x 156 mm silicon wafers Loading: manual wafer loading, robotic loading of boat to cantilever and furnace Batch size: 100 - 400 wafers Process time: dependent on process details (typically ~80 mins for industrial solar solar cells)

Tempress TS81004 Tube Furnace, 4-stack 6" Quartz Tube
Tempress TS81004 Tube Furnace, 4-stack 6" Quartz Tube