Raith 150TWO EBl system (SEM capability)
Location:
ANFF-NSW Node
Lab 1
Process type:
Microscopy - Atomic Force Microscopy (AFM)
Process summary:
Purpose- Scanning electron microscopy Material systems- Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire) Scale/volume- Single wafer up to 200mm diameter, Specifications/resolution- sub-10nm lithography. 10-30keV accelerating voltage. Fixed Beam Moving Stage option (stitch-free patterning over 150mm)
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information