Raith 150TWO EBl system (SEM capability)

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Microscopy - Atomic Force Microscopy (AFM)
Process summary: 

Purpose- Scanning electron microscopy Material systems- Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire) Scale/volume- Single wafer up to 200mm diameter, Specifications/resolution- sub-10nm lithography. 10-30keV accelerating voltage. Fixed Beam Moving Stage option (stitch-free patterning over 150mm)

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information