Quintel Q6000 mask aligner

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Pattern
Process summary: 

UV lithography 1 micron resolution; single or split-field microscope, Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire) Single wafer up to 100mm diameter (but limited alignment accuracy for chips above 25 mm)

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information