Quintel Q6000 mask aligner
Location:
ANFF-NSW Node
Lab 1
Process type:
Non Material Specific - Pattern
Process summary:
UV lithography 1 micron resolution; single or split-field microscope, Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire) Single wafer up to 100mm diameter (but limited alignment accuracy for chips above 25 mm)
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information