Pascal laser-molecular beam epitaxy system (general purpose)

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Deposition Thin Film
Process summary: 

Materials scouting using epitaxial growth techniques via a pulsed laser deposition. Catering for a range of substrates. Source Materials- A range of complex oxides including LAO, STO. Other materials by prior approval. Single wafer up to 25mm diameter. Target size 10mm diameter. Unit cell growth control. Scanning RHEED and combinatorial deposition.

Marquee: 
Yes
Operational Status: 
Operational

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