Pascal laser-molecular beam beam epitaxy system (sensitive materials)
Location:
ANFF-NSW Node
Lab 1
Process type:
Non Material Specific - Deposition Thin Film
Process summary:
Materials scouting using epitaxial growth techniques via a pulsed laser deposition. Catering for a range of substrates. Source Materials- of a range of complex oxides including LAO, STO. Single wafer up to 25mm diameter. Target size 10mm diameter. Unit cell growth control. Scanning RHEED and combinatorial deposition.
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information
