Pascal laser-molecular beam beam epitaxy system (sensitive materials)

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Deposition Thin Film
Process summary: 

Materials scouting using epitaxial growth techniques via a pulsed laser deposition. Catering for a range of substrates. Source Materials- of a range of complex oxides including LAO, STO. Single wafer up to 25mm diameter. Target size 10mm diameter. Unit cell growth control. Scanning RHEED and combinatorial deposition.

Marquee: 
Yes
Operational Status: 
Operational

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