Karl Suss MA6/BA6 mask aligner

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Pattern
Process summary: 

UV lithography sub-1micron resolution; back-side alignment capability; Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire); Single wafer up to 150mm diameter; 365nm - Mercury Arc Lamp

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information