Karl Suss MA6/BA6 mask aligner
Location:
ANFF-NSW Node
Lab 1
Process type:
Non Material Specific - Pattern
Process summary:
UV lithography sub-1micron resolution; back-side alignment capability; Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire); Single wafer up to 150mm diameter; 365nm - Mercury Arc Lamp
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information