In House - UVL suite of resist processing tools (spinners and hotplates)
Location:
ANFF-NSW Node
Lab 1
Process type:
Non Material Specific - Pattern
Process summary:
Ultraviolet Light Lithography (UVL) Flagship Capability support tools; Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire); Single chip or wafer up to 150mm diameter; spin up to 10,000rpm; bake up to 300C;
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information
