In House - Hollow cathode RIE system

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Pattern
Process summary: 

Hollow cathode RIE system; shallow etching of a range of materials; Process gases: O2, SF6, CF4, CHF3, Ar, CH4; Single wafer up to 75mm diameter; 13.56MHz 30-600W RF generator

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information