In House - Hollow cathode PECVD tool

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Deposition Thin Film
Process summary: 

Plasma Enhanced Chemical Vapour Deposition of SiO2, a-Si, SiXOyFz, doped SiO2. Process gases- CF4, N2O, Ar, N2, SiH4, NH3. Deposition of SiO2, a-Si, SixOyFz, Phosphorus doped SiO2, Boron doped SiO2, Germane doped SiO2. Approved substrate materials- Si, SiO2, Si3N4, Sapphire, Glass.

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information