In House - EBL suite of resist processing tools (spinners and hotplates)

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Pattern
Process summary: 

Electron Beam Lithography (EBL) Flagship Capability support tools; Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire); Single chip or wafer up to 150mm diameter; spin up to 10,000rpm; bake up to 300C;

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information