FEI Sirion/NPGS EBL system

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Pattern
Process summary: 

High resolution lithography (chip scale); Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire); Single chip up to max 50x50mm; sub-10nm lithography; 500V - 30kV accelerating voltage;

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information