FEI Sirion SEM

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Microscopy - Scanning Electron Microscopy (SEM-FIB/FEG)
Process summary: 

Purpose- Scanning electron microscopy, Material systems- Semiconductors (eg. Si, GaAs ), Insulators (eg. Glass, Quartz, Sapphire) Scale/volume- Single chip up to max 50x50mm Specifications/resolution- 2nm imaging capability. 500V - 30kV accelerating voltage

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information