EVG 620 Mask Aligner, UV-NIL

Location: 
ANFF-SA Node
Uni SA Mawson Lakes
Process type: 
Non Material Specific - Pattern
Process summary: 

Mask Aligner with UV-NIL (nano-imprint lithography) capability, high resolution double sided with splitfield microscopes capable of handling multiple wafer sizes with quick change-over time

Marquee: 
Yes
Operational Status: 
Operational
EVG 620 Mask Aligner, UV-NIL
EVG 620 Mask Aligner, UV-NIL