EVG 620 Mask Aligner, UV-NIL
Location:
ANFF-SA Node
Uni SA Mawson Lakes
Process type:
Non Material Specific - Pattern
Process summary:
Mask Aligner with UV-NIL (nano-imprint lithography) capability, high resolution double sided with splitfield microscopes capable of handling multiple wafer sizes with quick change-over time
Marquee:
Yes
Operational Status:
Operational

EVG 620 Mask Aligner, UV-NIL