Edwards thermal evaporator (MOS)

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Deposition Thin Film
Process summary: 

Directional thermal evaporation of Al. Si MOS compatible materials ONLY. Al depositions ONLY. Single chip up to 25mmx25mm. rotating stage. double angle evaporation, cooled evaporation

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information