Denton - O2 plasma ashers

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Materials Preparation
Process summary: 

Removal of thin photoresist and organic residue layers, surface activation, plasma cleaning; Most substrates; Single wafer; Denton low power ( approx 50-150W) Barrel Asher. 18cm diameter and 19cm deep.

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information