Denton - O2 plasma ashers
Location:
ANFF-NSW Node
Lab 1
Process type:
Non Material Specific - Materials Preparation
Process summary:
Removal of thin photoresist and organic residue layers, surface activation, plasma cleaning; Most substrates; Single wafer; Denton low power ( approx 50-150W) Barrel Asher. 18cm diameter and 19cm deep.
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information