CNT Savannah S200 ALD system

Location: 
ANFF-NSW Node
Lab 1
Process type: 
Non Material Specific - Deposition Thin Film
Process summary: 

Non directional atomic layer deposition of thin high quality dielectric layers (Al2O3, HfO2). Most substrates. single wafer up to max 200mm diameter

Marquee: 
Yes
Operational Status: 
Operational

See ANFF-NSW Website for Further Information