CNT Savannah S200 ALD system
Location:
ANFF-NSW Node
Lab 1
Process type:
Non Material Specific - Deposition Thin Film
Process summary:
Non directional atomic layer deposition of thin high quality dielectric layers (Al2O3, HfO2). Most substrates. single wafer up to max 200mm diameter
Marquee:
Yes
Operational Status:
Operational
See ANFF-NSW Website for Further Information