Beneq ALD

Location: 
ANU Engineering
ANU Bldg 32 E-114
Process type: 
Non Material Specific - Deposition Thin Film
Process summary: 

Atomic layer deposition - layers TiO2 (TiCL4) / Al2O3 (TMA) / Ga2O3 (TMG)

Marquee: 
Yes
Operational Status: 
Operational

During ALD coating two or more chemical vapors or gaseous precursors react sequentially on the substrate surface producing a solid film.

Beneq ALD
Beneq ALD